ASML Holding N.V. (ASML) announced that Intel Foundry is using ASML's High NA EUV technology on the Intel 18A process node to produce a subset of its Intel Core Ultra Series 3 processors. This milestone demonstrates high‑NA EUV readiness in production.

The High NA EUV lithography process, developed by ASML, enables more precise patterning for advanced chip manufacturing. The Intel Core Ultra Series 3 processors, code‑named Panther Lake, are built on Intel 18A. Using High NA EUV on selected layers gives ASML and Intel Foundry valuable data to refine system setup, uptime and manufacturing implementation.

Christophe Fouquet, ASML President and CEO, said, “With increased resolution and better process control, the introduction of High NA EUV marks a substantial development in semiconductor lithography…enabling the smaller, denser patterning that will accelerate advancements in AI and other emerging technologies.” Naga Chandrasekaran added that qualifying the process on select 18A layers provides customers with increased output while developing future options for leading‑edge performance and flexibility.

In 2024, Intel and ASML integrated the industry’s first commercial High NA EUV system at Hillsboro, Oregon. Intel Foundry also became the first company to install and pass acceptance testing of the second‑generation TWINSCAN EXE:5200 B, which boosts output and overlay accuracy. With this announcement, Intel Foundry is the first in the industry to ship high‑volume logic products using High NA EUV.